Nanoporous silicon nitride-based membranes of controlled pore size, shape and areal density: Fabrication as well as electrophoretic and molecular filtering characterization

• Axel Seidenstücker,
• Stefan Beirle,
• Fabian Enderle,
• Paul Ziemann,
• Othmar Marti and
• Alfred Plettl

Beilstein J. Nanotechnol. 2018, 9, 1390–1398, doi:10.3762/bjnano.9.131

• separation of fluorescent-labeled protein molecules [47]. Although the preparation may be addressed as demanding, the whole processing is factory compatible and stable, enabled by consequent application of parallel processes of unconventional lithography techniques. Inspired by recent reports [48][49][50][51

Controlled positioning of nanoparticles on a micrometer scale

• Fabian Enderle,
• Oliver Dubbers,
• Alfred Plettl and
• Paul Ziemann

Beilstein J. Nanotechnol. 2012, 3, 773–777, doi:10.3762/bjnano.3.86

• distances >1 µm on top of Si substrates. By using these NPs as masks for a subsequent reactive ion etching, the square pattern is transferred into Si as a corresponding array of nanopillars. Keywords: electron beam lithography; nanoparticles; positioning; self-assembling; unconventional lithography